| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing apparatus and a developing method which can improve the patterning precision of a resist development and have high reliability. SOLUTION: The resist developing apparatus is equipped with: a first guide 16 which guides a tape 10 around the center 16a toward the liquid surface of a developing solution 12; a second guide 20 which guides the tape 10 ejected from the liquid surface; a third guide 18 which guides the tape 10 in the developing solution 12 toward the second guide 20 and which descends in accordance with descent of the liquid surface; an injection section 22 which injects the developing solution 12 from the lateral position of the tape 10; and an injection section support 30 which supports the injection section 22 and which can move by rotating around the center 16a of the first guide 16 as the point of support. The approach angle of the tape 10 to the liquid surface varies with descent of the third guide 18, and the descent of the third guide 18 and the rotation movement of the injection section support 30 interlock with each other to make the between the injection section 22 and the tape 10 constant. COPYRIGHT: (C)2005,JPO&NCIPI |
