发明名称 Plated terminations
摘要 Improved termination features for multilayer electronic components are disclosed. Monolithic components are provided with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. The subject plated terminations are guided and anchored by exposed internal electrode tabs and additional anchor tab portions which may optionally extend to the cover layers of a multilayer component. Such anchor tabs may be positioned internally or externally relative to a chip structure to nucleate additional metallized plating material. External anchor tabs positioned on top and bottom sides of a monolithic structure can facilitate the formation of wrap-around plated terminations. The disclosed technology may be utilized with a plurality of monolithic multilayer components, including interdigitated capacitors, multilayer capacitor arrays, and integrated passive components. A variety of different plating techniques and termination materials may be employed in the formation of the subject self-determining plated terminations.
申请公布号 US2005046536(A1) 申请公布日期 2005.03.03
申请号 US20040951972 申请日期 2004.09.28
申请人 RITTER ANDREW P.;HEISTAND ROBERT;GALVAGNI JOHN L.;DATTAGURU SRIRAM 发明人 RITTER ANDREW P.;HEISTAND ROBERT;GALVAGNI JOHN L.;DATTAGURU SRIRAM
分类号 H01G4/252;B05D5/12;H01F5/00;H01G4/005;H01G4/228;H01G4/30;H01G7/00;H01L23/48;H05K1/09;H05K1/11;(IPC1-7):H01G7/00 主分类号 H01G4/252
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