发明名称 |
PHOTO-RESIST SUPPLYING APPARATUS SUPPLYING CONTINUOUSLY NITROGEN GAS TO INTERIOR OF NOZZLE USING BUBBLE GENERATING RESTRAINER |
摘要 |
PURPOSE: A photo-resist supplying apparatus is provided to prevent the shortage of injection amount due to a bubble by supplying continuously nitrogen gas to the interior of nozzle using a bubble generating restrainer. CONSTITUTION: A photo-resist is stored in a supply tank(1). The supply tank is communicated with a buffer tank(5). The photo-resist stored in the buffer tank is forcibly pumped by a pump(11). The photo-resist pumped by the pump is injected through a injection nozzle(15). A generation of bubble from the interior of the injection nozzle is prevented by a bubble generating restrainer(20).
|
申请公布号 |
KR20050019554(A) |
申请公布日期 |
2005.03.03 |
申请号 |
KR20030057381 |
申请日期 |
2003.08.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, DAE KWON |
分类号 |
H01L21/033;(IPC1-7):H01L21/033 |
主分类号 |
H01L21/033 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|