| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning agent composition for removing a photosensitive resin composition, the cleaning agent composition for efficiently removing a color resist in a short period of time which is used in the edge part and the back face of a substrate, in particular, a large colored glass substrate for the manufacture of a liquid crystal display device, and which unnecessarily deposits on the device, the cleaning agent having excellent cleaning property with which level difference on the interface is reduced and the substrate is cleaned after development. <P>SOLUTION: The cleaning agent composition for removing a photosensitive resin composition to be used in the manufacturing process of a semiconductor element and a liquid crystal display element, contains alkyl amide and ketone. Further, the cleaning agent composition may contain perfluoroalkylamine oxide. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
