| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for treating a quartz glass surface that is capable of forming fine unevenness on the surface of the quartz glass using hydrofluoric acid which is a general surface treatment liquid as an etching solution for quartz glass, and which is therefor small in environmental load and does not necessitate excessive waste water disposal equipment, and to provide a quartz glass tool where the fine unevenness is formed without causing micro-cracks on the surface. SOLUTION: The method for treating the quartz glass comprises adhering hydrofluoric acid microparticles comprised of from 10% or more to 75% or less of hydrofluoric acid, of which the maximum value of the particle size is 300μm or less and the average particle size is 3-50μm, to the surface of the quartz glass(may be also referred to as hydrofluoric acid mist or simply to as mist), carrying out the etching of the quartz glass only on the part of the quartz glass to which the hydrofluoric acid microparticles are adhered and forming the fine unevenness on the surface of the quartz glass. COPYRIGHT: (C)2005,JPO&NCIPI
|
