发明名称 HIGHLY-DESIGNED UNEVEN PRINTED MATTER AND MANUFACTURING METHOD FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a highly-designed uneven printed matter using a high-gloss substrate and a high-gloss pigment without furnishing an embossing-finish. SOLUTION: In forming a transparent resin film on the printed matter for which the high-gloss substrate and the high-gloss pigment are used, a springing layer is formed as an underlayer, or an uneven coating is applied by a gravure or screen coating machine. The material used for the high-gloss substrate is a vapor deposited paper, Al glued paper and a pearl paper. The material used for the high-gloss pigment is a metallic pigment, a pearl pigment and a polarization pearl pigment. The resin layer is preferably the resin which cures in a short time such as a UV-curing one, an EB-curing one or an evaporation-drying one. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005053208(A) 申请公布日期 2005.03.03
申请号 JP20030317532 申请日期 2003.08.06
申请人 KOTOBUKI SEIHAN PRINTING CO LTD 发明人 MAE HIROSHI;NAKANISHI YASUO;NAKAO MITSUHIRO
分类号 B41M3/06;B32B3/30;B41M7/00;(IPC1-7):B41M3/06 主分类号 B41M3/06
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