发明名称 Optical interconnect and method for making the same
摘要 A method of fabricating an integrated optical interconnection includes forming a first optical waveguide in a semiconductor substrate, forming a first layer of dielectric material disposed above the optical waveguide, forming an optical interconnect in the first dielectric layer and disposed proximate to the first optical waveguide. The method further includes forming a second layer of dielectric material disposed above the optical interconnect, forming a second optical waveguide in the second layer of dielectric material and disposed proximate to the first optical waveguide, and forming a conductive contact disposed above and proximate the second optical waveguide.
申请公布号 US2005047708(A1) 申请公布日期 2005.03.03
申请号 US20030648717 申请日期 2003.08.26
申请人 MA KELVIN;TOLLIVER TODD R.;SODERBERG JOHN J. 发明人 MA KELVIN;TOLLIVER TODD R.;SODERBERG JOHN J.
分类号 G02B6/12;G02B6/134;G02B6/43;(IPC1-7):G02B6/12;G02B6/26 主分类号 G02B6/12
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