ARRANGEMENT FOR INSPECTING OBJECTS, ESPECIALLY MASKS IN MICROLITHOGRAPHY
摘要
The invention relates to an arrangement for inspecting objects, especially masks in microlithography. Said masks are disposed in a vacuum chamber. A converter converts illuminating radiation emitted from the object into radiation of a higher wave length. A sensor is also provided for recording images. The sensor is disposed outside the vacuum chamber and is arranged as an optical interface between the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
申请公布号
WO2004095136(A3)
申请公布日期
2005.03.03
申请号
WO2004EP04161
申请日期
2004.04.20
申请人
CARL ZEISS SMS GMBH;DOBSCHAL, HANS-JUERGEN;HARNISCH, WOLFGANG;SCHERUEBL, THOMAS;ROSENKRANZ, NORBERT;SEMMLER, RALPH
发明人
DOBSCHAL, HANS-JUERGEN;HARNISCH, WOLFGANG;SCHERUEBL, THOMAS;ROSENKRANZ, NORBERT;SEMMLER, RALPH