发明名称 METHOD FOR FORMING PATTERN AND TWO-LAYER STRUCTURE MICROLENS USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To form a recessed or projected figure having an almost perpendicular wall face to a substrate. <P>SOLUTION: In the process of exposing a photosensitive resin layer to parallel light beams via a microlens so as to harden into a recessed and projected figure having an almost perpendicular wall face to the photosensitive resin layer, the exposure light quantity is discontinuously increased from a part 42 to be formed into a recess to a part 41 to be formed into a projection, and moreover, the exposure light quantity Iy in a part to be formed into the edge 41a of the projection is controlled to be larger than the light quantity Iz in a part to be the center 41b of the projection. As the exposure light quantity drastically changes inside and outside the wall face of the recess and projection, the wall face is made almost perpendicular. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005055549(A) 申请公布日期 2005.03.03
申请号 JP20030206614 申请日期 2003.08.07
申请人 SHARP CORP 发明人 UEDA MINORU;OKADA NORIAKI
分类号 G02F1/1335;G02B3/00;G03F7/20 主分类号 G02F1/1335
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