| 摘要 |
PROBLEM TO BE SOLVED: To inhibit deposition of an evaporation material on a low-temperature part in an aperture of an evaporation source. SOLUTION: A heating means 13A is provided between a side wall member 13 and a cell 11 containing the evaporation material M. Above the cell 11, a cell cap 12, on which a vapor efflux aperture 12A for the evaporation material is formed, and a cover 15, on which an aperture corresponding to the vapor efflux aperture is formed, are provided. A heat-shielding plate 16 which is made of SUS or tantalum and has an aperture corresponding to the vapor efflux aperture, is provided between the cell cap 12 and the cover 15. The shielding plate made of the low-thermal conductivity material keeps an appropriate temperature around the aperture and inhibits the solidification phenomenon around the aperture caused by temperature drop. COPYRIGHT: (C)2005,JPO&NCIPI
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