| 摘要 |
PURPOSE: A plasma processing apparatus is provided to smoothly control the movement of a confinement ring by preventing a distortion or deviation of a spring during plasma processing. CONSTITUTION: A plasma processing apparatus comprises a confinement ring(150), a plunger(120), a cylindrical spring(130), a spring bar(132), and a guide bar(134). The confinement ring is arranged in a process chamber in such a manner that the confinement ring is movable by using a cam ring(110). The plunger is fixed at the confinement ring so as to move the confinement ring in a vertical direction. The cylindrical spring is arranged around the plunger so as to press the plunger toward a lower surface of the cam ring. The spring bar is arranged in the vicinity of the plunger so as to fix the spring around the plunger, and has a contact portion(132a) having an outer diameter with the size same as that of the inner diameter of the spring. The guide bar faces the contact portion in such a manner that the spring is fixed between the contact portion of the spring bar and the guide bar.
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