发明名称 Process for manufacture of radiation image storage panel
摘要 A radiation image storage panel is manufactured by the steps of heating and vaporizing an evaporation source comprising a phosphor or its starting materials and depositing the vaporized phosphor or materials on a substrate to form a phosphor layer in an evaporation-deposition apparatus, in which the steps are carried out at a pressure of 0.05 to 10 Pa and under the following condition: 0.3<=(T-S)/MFP<=300 in which MFP stands for a mean free path (unit:meter) of the vaporized phosphor or materials, and T-S stands for a space (unit:meter) between the evaporation source and the substrate.
申请公布号 US2005048197(A1) 申请公布日期 2005.03.03
申请号 US20040927032 申请日期 2004.08.27
申请人 FUJI PHOTO FILM CO., LTD. 发明人 IWABUCHI YASUO;MATSUMOTO HIROSHI
分类号 G21K4/00;B05D5/06;C09K11/00;C09K11/08;C09K11/61;C09K11/62;C09K11/64;C09K11/77;C09K11/85;C23C14/24;G01T1/00;(IPC1-7):B05D5/06 主分类号 G21K4/00
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