发明名称 FLUORINE ATOM-CONTAINING POLYMERIZABLE UNSATURATED MONOMER, FLUORINE ATOM-CONTAINING POLYMER AND RESIN COMPOSITION FOR PHOTORESIST
摘要 <P>PROBLEM TO BE SOLVED: To provide a new fluorine-containing polymerizable unsaturated monomer useful for obtaining a polymer having high transparency to a light of a wavelength not more than 300 nm, especially of vacuum ultraviolet light such as F<SB>2</SB>excimer laser (157 nm) etc. <P>SOLUTION: The fluorine-containing polymerizable unsaturated monomer is represented by formula (1a) or (1b), wherein rings Z<SP>1</SP>and Z<SP>2</SP>show each an alicyclic carbon ring; R<SP>1</SP>, R<SP>2</SP>and R<SP>3</SP>show each an alkyl group or a fluoroalkyl group; W shows a single bond or a linking group; R shows a specified unsaturated acyl group; provided that, in formula (1a), at least one of R<SP>1</SP>and R<SP>2</SP>etc., is a fluorine atom or a fluoroalkyl group and, in formula (1b), (i) a fluorine atom or a fluoroalkyl group is bound with the ring Z<SP>2</SP>or (ii) R<SP>3</SP>is a fluoroalkyl group. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005054162(A) 申请公布日期 2005.03.03
申请号 JP20030322602 申请日期 2003.09.16
申请人 DAICEL CHEM IND LTD 发明人 KOYAMA YUTAKA;TSUTSUMI KIYOHARU
分类号 C07C67/03;C07C69/013;C07C69/54;C08F20/22;C08F220/18;C08F220/22;G03F7/004;G03F7/039 主分类号 C07C67/03
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