| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner which can carry out stable exposure while keeping high vacuum state by preventing outgas from diffusing to a space wherein a mirror and a reticle are arranged. SOLUTION: In the aligner, light flux emitted from a light source is cast on a treatment object mounted on a first stage through an exposure optical system and the treatment object is exposed. The aligner has a partition for dividing into a first space wherein the first stage is arranged and a second space wherein the exposure optical system is arranged, a first control means for controlling vacuum degree of the first space, and a second control means for controlling vacuum degree of the second space. COPYRIGHT: (C)2005,JPO&NCIPI |
