| 摘要 |
An apparatus for scattered light inspection of optical elements, having a light-generating unit (2) for generating light that is irradiated onto the optical element (9) respectively to be inspected, and a detector (4) for detecting scattered light (14) that is emitted by the optical element during irradiation. At least a portion of the components (2 to 8, 12) of the inspection apparatus are arranged on or in a housing/holding unit (1) that is dimensioned such that it can be held by a reticule holder of a lithography exposure machine, or all the components of the inspection apparatus are arranged on or in a common housing/holding unit that is portable and/or mobile. The apparatus may be used, e.g., for scattered light inspection of the surface of a lens, closest to the field, of a projection objective of a microlithography projection exposure machine.
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