发明名称 |
PROCESS FOR PRODUCING HEXAFLUOROETHANE AND USE THEREOF |
摘要 |
A process for producing hexafluoroethane, comprising a step of distilling a crude hexafluoroethane containing chlorine compounds each having two carbon atoms to distill out hexafluoroethane as a top flow from the top of a distillation column and separate a hexafluoroethane mixture containing the chlorine compounds as a bottom flow from the bottom, and a step of contacting the bottom flow with hydrogen fluoride in the gas phase at a temperature of 300 to 500 °C in the presence of a fluorination catalyst to fluorinate the chlorine compounds. This process provides hexafluoroethane which can be used mainly as a cleaning gas in the production process of a semiconductor device. |
申请公布号 |
WO2005019141(A2) |
申请公布日期 |
2005.03.03 |
申请号 |
WO2004JP11709 |
申请日期 |
2004.08.09 |
申请人 |
SHOWA DENKO K.K.;OHNO, HIROMOTO;ARAI, TATSUHARU |
发明人 |
OHNO, HIROMOTO;ARAI, TATSUHARU |
分类号 |
C11D7/30;B01J23/26;C07B61/00;C07C17/10;C07C17/20;C07C17/21;C07C17/354;C07C17/383;C07C17/395;C07C19/08;H01L21/3065 |
主分类号 |
C11D7/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|