发明名称 PROCESS FOR PRODUCING HEXAFLUOROETHANE AND USE THEREOF
摘要 A process for producing hexafluoroethane, comprising a step of distilling a crude hexafluoroethane containing chlorine compounds each having two carbon atoms to distill out hexafluoroethane as a top flow from the top of a distillation column and separate a hexafluoroethane mixture containing the chlorine compounds as a bottom flow from the bottom, and a step of contacting the bottom flow with hydrogen fluoride in the gas phase at a temperature of 300 to 500 °C in the presence of a fluorination catalyst to fluorinate the chlorine compounds. This process provides hexafluoroethane which can be used mainly as a cleaning gas in the production process of a semiconductor device.
申请公布号 WO2005019141(A2) 申请公布日期 2005.03.03
申请号 WO2004JP11709 申请日期 2004.08.09
申请人 SHOWA DENKO K.K.;OHNO, HIROMOTO;ARAI, TATSUHARU 发明人 OHNO, HIROMOTO;ARAI, TATSUHARU
分类号 C11D7/30;B01J23/26;C07B61/00;C07C17/10;C07C17/20;C07C17/21;C07C17/354;C07C17/383;C07C17/395;C07C19/08;H01L21/3065 主分类号 C11D7/30
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