发明名称 Production of optically active micro-structures, e.g. lenses, comprises mechanically forming an optically active surface topography on a substrate, masking the topography by photolithography, and smoothing by etching
摘要 <p>#CMT# #/CMT# Production of optically active micro-structures, especially lenses, lens arrays and prisms, comprises mechanically forming an optically active surface topography on a substrate, masking the topography by photolithography, and smoothing using an etching process. #CMT#USE : #/CMT# For producing optically active micro-structures, especially lenses, lens arrays and prisms. #CMT#ADVANTAGE : #/CMT# The process can be used on an industrial scale with high precision. #CMT#ELECTRONICS : #/CMT# Preferred Features: The optically active surface topography is smoothed by plasma-promoted dry etching, especially plasma etching or reactive ion etching. The substrate is made from quartz or silicon.</p>
申请公布号 DE10354181(A1) 申请公布日期 2005.03.03
申请号 DE2003154181 申请日期 2003.11.19
申请人 INGENERIC GMBH;SUSS MICROOPTICS SA, NEUCHATEL 发明人 HAMBUECKER, STEFAN;RUEBENACH, OLAF;SINHOFF, VOLKER;VOELKEL, REINHARD;EISNER, MARTIN;FISCHER, KATRIN;WEIBLE, KENNETH J.
分类号 B29D11/00;G02B3/00;G03F7/00;(IPC1-7):G03F7/00 主分类号 B29D11/00
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