发明名称 |
Production of optically active micro-structures, e.g. lenses, comprises mechanically forming an optically active surface topography on a substrate, masking the topography by photolithography, and smoothing by etching |
摘要 |
<p>#CMT# #/CMT# Production of optically active micro-structures, especially lenses, lens arrays and prisms, comprises mechanically forming an optically active surface topography on a substrate, masking the topography by photolithography, and smoothing using an etching process. #CMT#USE : #/CMT# For producing optically active micro-structures, especially lenses, lens arrays and prisms. #CMT#ADVANTAGE : #/CMT# The process can be used on an industrial scale with high precision. #CMT#ELECTRONICS : #/CMT# Preferred Features: The optically active surface topography is smoothed by plasma-promoted dry etching, especially plasma etching or reactive ion etching. The substrate is made from quartz or silicon.</p> |
申请公布号 |
DE10354181(A1) |
申请公布日期 |
2005.03.03 |
申请号 |
DE2003154181 |
申请日期 |
2003.11.19 |
申请人 |
INGENERIC GMBH;SUSS MICROOPTICS SA, NEUCHATEL |
发明人 |
HAMBUECKER, STEFAN;RUEBENACH, OLAF;SINHOFF, VOLKER;VOELKEL, REINHARD;EISNER, MARTIN;FISCHER, KATRIN;WEIBLE, KENNETH J. |
分类号 |
B29D11/00;G02B3/00;G03F7/00;(IPC1-7):G03F7/00 |
主分类号 |
B29D11/00 |
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