VACUUM CHUCK APPARATUS AND METHOD FOR HOLDING A WAFER DURING HIGH PRESSURE PROCESSING

摘要

Method and apparatus for holding a wafer having a wafer dimension during processing, the vacuum chuck comprising a concave wafer platen configured force the wafer into intimate contact with the wafer platen and provide a seal therebetween when high pressure is applied to the wafer. The wafer platen for preventing matter from entering between the wafer and vacuum chuck. A groove configured in the wafer platen applies vacuum to the underside of the wafer. A plenum configured in the platen provides pressure for a predetermined amount of time between the wafer and the vacuum chuck to disengage the wafer.