| 摘要 |
PURPOSE: A system and a method for diagnosing plasma processing chamber are provided to grasp and pre-estimate the characteristic of the physical and chemical phenomenon by the computer simulation linked with a theoretical model. CONSTITUTION: A plasma chamber is computer-simulated by a simulator(10) according to the numerical analysis relative to a theoretical model related to a physical/chemical reaction of the interior of a plasma chamber. The drive of the simulator(for example, starting and ending) is controlled by a server(20). All input/output data relative to the computer simulation are created/managed/controlled by a client(30).
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