发明名称 |
MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME |
摘要 |
<p>A material for an insulating film which comprises a copolymer obtained by reacting a polyamide having a specific structure and a reactive oligomer as a component forming the film; a coating varnish for an insulating film which comprises this material and an organic solvent; an insulating film which comprises a layer of a resin comprising as a main structure a polybenzoxazole which is obtained by treating the above material or the above coating varnish by heating so that condensation reaction and crosslinking reaction take place and has fine pores; and a semiconductor device which comprises an insulating interlayer film for multi-layer wiring comprising the insulating film and/or a surface protective film comprising the insulating film. Excellent electrical, thermal and mechanical properties are exhibited and a low permittivity can be achieved.</p> |
申请公布号 |
EP1333050(A4) |
申请公布日期 |
2005.03.02 |
申请号 |
EP20010967765 |
申请日期 |
2001.09.20 |
申请人 |
SUMITOMO BAKELITE CO., LTD. |
发明人 |
ENOKI, TAKASHI;SAITO, HIDENORI;HIGASHIDA, NOBUHIRO;ISHIDA, YUICHI |
分类号 |
C08G69/48;C08G73/22;C08G81/00;C08J5/18;C09D179/04;H01B3/30;H01L21/312;H05K1/00;(IPC1-7):C08G81/00;H05K3/46;H05K3/28;H01L21/762 |
主分类号 |
C08G69/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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