发明名称 |
Linewidth measurement tool calibration method employing linewidth standard |
摘要 |
A method for calibrating a linewidth measurement tool and a system for calibrating the linewidth measurement tool each employ a correction of a series of periodic actual measurements of at least one single measurement location of a topographic feature within a linewidth standard with an exponentially weighted moving average of a series of deviations of the series of periodic actual measurements from a corresponding series of regressed data points derived from mathematical regression of the series of periodic actual measurements. Such a correction provides for a more accurate calibration of the linewidth measurement tool and a more accurate measurement of linewidths within microelectronic products while employing the calibrated linewidth measurement tool.
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申请公布号 |
US6862545(B1) |
申请公布日期 |
2005.03.01 |
申请号 |
US20030406988 |
申请日期 |
2003.04.03 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
LEE PEY-YUAN;YANG HONG-JI;CHEN YI-HUNG;LO CHI-SHEN;FUH CHEN-NING;LEE WEN-CHUNG |
分类号 |
G01B21/02;G03F7/20;G06F19/00;(IPC1-7):G06F19/00 |
主分类号 |
G01B21/02 |
代理机构 |
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代理人 |
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地址 |
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