| 摘要 |
There is disclosed a polishing plate for polishing a workpiece by rubbing the workpiece to be processed with the polishing plate, comprising at least a substrate and a polishing material, the polishing material being a vapor phase synthetic polycrystalline diamond film deposited on a surface of the substrate to rub the workpiece to be processed. The present invention provides a polishing plate of which production cost is low and which can effectively polish a surface of a workpiece to be processed comprising a very hard material such as DLC, SiC, SiN, Si or the like and extremely smooth the surface. |
