发明名称 Projection optical system and exposure apparatus with the same
摘要 A projection optical system projects an image of a first surface onto a second surface, and has a lens component formed of fluorite and a lens component formed of silica, and further includes: a first lens group including at least one lens component formed of fluorite and having a positive refractive power; a second lens group which is arranged in an optical path between the first lens group and the second surface and which has a negative refractive power; and a third lens group which is arranged in an optical path between the second lens group and the second surface and having a positive refractive power; wherein when the number of the lens components formed of silica is Snum, the number of the lens components formed of fluorite is Cnum, and a numerical aperture of the second surface side of the projection optical system is NA, the following conditions are satisfied:
申请公布号 US6862078(B2) 申请公布日期 2005.03.01
申请号 US20010029210 申请日期 2001.12.28
申请人 NIKON CORPORATION 发明人 SUZUKI TAKESHI
分类号 G02B13/24;G02B13/14;G02B13/18;G02B13/22;G03F7/20;G03F7/22;H01L21/027;(IPC1-7):G03B27/54;G03B27/42 主分类号 G02B13/24
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