发明名称 Reflection type projection optical system, exposure apparatus and device fabrication method using the same
摘要 A reflection type projection optical system for projecting a pattern on an object surface onto an image surface and forming an imaging system that forms an intermediate image between the object surface and image surface includes four or more mirrors arranged substantially as a coaxial system to reflect light from an object side to an image side, reflection surfaces on the four or more mirrors forming the same direction for forming a reflection angle.
申请公布号 US6860610(B2) 申请公布日期 2005.03.01
申请号 US20030359937 申请日期 2003.02.06
申请人 CANON KABUSHIKI KAISHA 发明人 TERASAWA CHIAKI
分类号 G02B17/00;G02B17/06;G02B27/18;G03F7/20;H01L21/027;(IPC1-7):G02B5/08;G02B5/10 主分类号 G02B17/00
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