| 摘要 |
PURPOSE: A chemical flow monitoring system for a chemical vapor deposition system is provided to check the wrong operation of the equipment by measuring change of the chemical supply amount with a flow meter, and to prevent the process failure by checking the equipment with a user and setting the checking reference. CONSTITUTION: A chemical flow monitoring system of a chemical vapor deposition system is composed of a flow controller(310) regulating the supply amount by flowing nitrogen, a bubbler(320) vaporizing by bubbling chemicals such as nitrogen, TEOS(Tetra ethyl ortho silicate), TMPi(Tri methyl phosphite) and TMB(Tri methyl boron), a valve(330) installed in a line for vaporizing and supplying TEOS, TMPi and TMB to a chamber after bubbling N2, a flow meter(340) installed in the stage after the valve to measure and display the amount of N2 and the amount of vaporized chemicals after bubbling N2, and a controller(350) performing the interlock mode if the detected amount from the flow meter is over the upper limit or below the lower limit.
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