POLYMER MIXTURE FOR PHOTORESIST AND PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

A POLYMER MIXTURE FOR A PHOTORESIST COMPOSITION, AND A PHOTORESIST COMPOSITION CONTAINING THE POLYMER MIXTURE. THE POLYMER MIXTURE INCLUDES A POLYMER THAT HAS TWO OR MORE DIFFERENT MONOMERS AND AN ACID-LABILE DI-ALKYLMALONATE GROUP BOUND TO THE BACKBONE OF THE POLYMER; A POLYMER THAT HAS A MONOMER OF (METH)ACRYLATE DERIVATIVE AND ONE OR MORE OTHER MONOMERS; OR A POLYMER THAT HAS A MONOMER OF ALKOXYSTYRENE AND ONE OR MORE OTHER MONOMERS. THE PO1YMER MIXTURES ARE SUITABLE FOR FORMING PHOTORESIST COMPOSITIONS THAT GENERATE A PATTERN HAVING AN EXCELLENT PROFI1E, DUE TO THE HIGH CONTRAST AND HIGH THERMAL DECOMPOSITION TEMPERATURE OF THE PHOTORESIST COMPOSITION. THE PHOTORESIST COMPOSITION OF THE PRESENT INVENTION FURTHER INCLUDE A PHOTOSENSITIVE ACID GENERATOR.