| 摘要 |
FIELD: physics; lighting. ^ SUBSTANCE: system of a very narrowband two-chamber gas-discharge laser with high repetition rate has two separate discharge chambers, one of which is part of the driving generator, generating a very narrowband transmitted beam, which, using a retransmitting optical system, is directed through the second discharge chamber for obtaining an amplified output beam. The system also consists of a beam transmission unit, containing a structure for limiting the path of the beam, forming a path for transmitting the laser beam to the laser input window on the lithographic device, and a system for measuring and controlling the laser beam, designed for measuring the pulse energy, wave length and band width of output laser pulses, generated by the two-chamber laser system, and controlling output laser pulses using a control circuit with feedback. ^ EFFECT: constant illumination of the plane of plate in the lithographic system for the whole period of its life span. ^ 13 cl, 23 dwg |
