CLEANING APPARATUS AND CLEANING METHOD USING THE SAME FOR PREVENTING CLEANING DEFECT AT CONTACT PART BETWEEN SUBSTRATE AND SUBSTRATE SUPPORTER

摘要

PURPOSE: A cleaning apparatus and a cleaning method using the same are provided to prevent a cleaning defect at a contact part between a substrate and a substrate supporter by using the substrate supporter separable from the substrate and a holder for holding the substrate. CONSTITUTION: A bath(100) is used for storing a cleaning solution. A substrate supporter(104) is used for supporting a substrate within the bath and is separated from the substrate before the substrate supporter comes in contact with the cleaning solution. A substrate holder(140) is used for holding the substrate from the outside of the cleaning solution before the substrate supporter is separated from the substrate.