发明名称 REDUCED-REFLECTION FILM HAVING LOW-REFRACTIVE-INDEX LAYER
摘要 <p>A anti-reflection film with pen scratch resistance has a low refractive index layer formed from a raw material composition containing silicon oxide and a crosslinking agent as main components. The raw material composition contains 1 to 10 wt % of a polymerization initiator and 1 to 5 wt % of a polysiloxane resin with respect to the sum of silicon oxide and the crosslinking agent.</p>
申请公布号 KR20050016503(A) 申请公布日期 2005.02.21
申请号 KR20047019686 申请日期 2004.12.03
申请人 发明人
分类号 G02B1/10;G02F1/1335;B32B7/02;B32B27/00;C08J7/04;G02B1/11;G06F3/033;(IPC1-7):G02B1/10 主分类号 G02B1/10
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