METHOD FOR FORMING LINE PATTERN, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ELECTRO-OPTIC DEVICE AND ELECTRONIC APPARATUS FOR FORMING LINE PATTERN HAVING FLAT SURFACE

摘要

PURPOSE: A method for forming a line pattern, a method for manufacturing a semiconductor device, an electro-optic device and an electronic apparatus are provided to form a line pattern having a very flat surface. CONSTITUTION: A sublimation layer including a sublimating material is formed on an optic-thermal conversion layer(8) including a material of converting optical energy to thermal energy. Light is irradiated to a predetermined portion of the sublimation layer to sublimate a part of the sublimation layer and banks(B) composed of the sublimation layer is formed in the region other than the portion to which the light is irradiated. A conductive layer(7) is disposed between the banks to form a conductive pattern layer composed of the conductive layer and the banks. Light is irradiated to a predetermined portion of the optic-thermal conversion layer to transfer the conductive pattern layer to a base(2) to be processed.