| 摘要 |
PURPOSE: A photoresist coating apparatus and a method for driving the apparatus are provided to maintain photoresist coated on a substrate in a uniform thickness by reciprocating the substrate coated with the photoresist in horizontal and vertical directions. CONSTITUTION: A photoresist coating apparatus includes an inner stage(64a) on which a substrate is mounted, an outer stage(64b), the first external power supply(63), the second external power supply(66), and a pump. The inner stage includes magnets respectively attached to sides in X- and Y-axis directions. The outer stage surrounds the sides and bottom of the inner stage and includes the first coil(63a,63b) and the second coil(66a,66b) inside the sides opposite to the sides of the inner stage. The outer stage includes a plurality of air holes penetrating the face opposite to the bottom face of the inner stage. The first external power supply applies power to the first coil to provide a magnetic force to the first coil. The second external power supply applies power to the second coil to provide a magnetic force to the second coil. The pump introduces the air into the outer stage through the air holes or inhales the air inside the outer stage.
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