THIN FILM MANUFACTURING APPARATUS COMPRISING SYSTEM CAPABLE OF PERFORMING DOWNFLOW VENT WITHOUT STOPPING OF GAS IN DOWNFLOW STATE OF APPARATUS WHEN VENTING INSIDE OF APPARATUS AND METHOD FOR MANUFACTURING THIN FILM USING THE APPARATUS

摘要

PURPOSE: To provide a thin film manufacturing apparatus and a thin film manufacturing method for improving productivity and mass-production of thin film by reproducing good film thickness distribution, composition distribution and film forming rate, reducing the number of particles and stably forming a continuous film over a long period of time. CONSTITUTION: In a thin film manufacturing apparatus that is a CVD(chemical vapor deposition) apparatus for forming a film by chemical reaction on a substrate heated by the substrate stage after introducing a film forming gas into the reaction chamber through the shower head from an upper part of a reaction chamber that is a reaction space of a vacuum controllable vacuum tank(1), the apparatus for manufacturing thin film is characterized in that the reaction space comprises a substrate stage(4), a shower head(3) and adhesion preventing plates(6), a gas exhaustion path is formed in an opening(8) between concentric circles comprising the adhesion preventing plates and the substrate stage, an inert gas flows along the adhesion preventing plates from the upper side of the gas exhaustion path, and a lower space is formed at a second side of the gas exhaustion path.