| 摘要 |
PURPOSE: Provided are photosensitive resin composition, method for formation of transparent pattern with good stripping property and resolution using the same, color filter containing transparent pattern and liquid crystal display even with large amount of light exposure. CONSTITUTION: The photosensitive resin composition comprises (A) binder polymer, (B) photo-polymerizing compound, (C) photo-polymerizing initiator containing at least one of acetophenone based compound, (D) photo-polymerizing initiation aid containing at least one of amine based compound, and (E) solvent. Total amount of (C) and (D) components is 0.1 to 20 mass parts to 100 mass parts of total amount of (A) and (B) components and amount of (D) component is 0.6 to 10 mass parts to 1 mass part of (C) component. The pattern is formed by coating the photosensitive resin composition on substrate, removing volatile components from the coated color resin composition, and exposing the coated layer through photo-mask then developing the exposed layer.
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