CVD APPARATUS HAVING HEATER TABLE CAPABLE OF DETERMINING PM PERIOD ACCURATELY BY MONITORING DEPOSITED LAYER DETECTOR

摘要

PURPOSE: A CVD(Chemical Vapor Deposition) apparatus having a heater table is provided to reduce the amount of used wafer by determining PM(Preventive Maintenance) period accurately by monitoring a deposited layer detect signal from a deposited layer detector. CONSTITUTION: A CVD apparatus having a heater table includes a reaction chamber, a heater table(20), and a deposited layer detector(60). The reaction chamber forms a predetermined layer on a wafer using CVD. The heater table is implemented in the reaction chamber and includes a center region for supporting the wafer and an upper surface having an edge region around the center region. The deposited layer detector is implemented on the heater table to detect the deposited layer formed on an edge region(24) of the heater table.