IMPURITY ELUTION APPARATUS FOR COLLECTING SIMULTANEOUSLY OR SEQUENTIALLY SAMPLES INCLUDING IMPURITIES

摘要

PURPOSE: An impurity elution apparatus is provided to reduce a time for acquiring samples including impurities by collecting simultaneously or sequentially the samples including the impurities from an upper surface of a semiconductor substrate. CONSTITUTION: A support unit(110) is used for supporting a substrate(10). A sample plate(130) comes in contact to an upper surface of a substrate supported by the support unit. The sample plate includes an eluant for eluting impurities contained in an exposed part of the upper surface of the substrate. In addition, the sample plate further includes a plurality of holes to samples including the impurities. The support unit includes a chuck for supporting a center part of the substrate, a drive unit for moving the chuck to the vertical direction, and an edge supporter for supporting an edge part of the substrate.