发明名称 PHOTOCHROMIC PRIMER COMPOSITION WITH HIGH IMPACT RESISTANCE, COMPRISING BROENSTED SALTS-CONTAINING POLYURETHANE, POLYEPOXY RESIN AND PHOTOCHROMIC DYE, AND TRANSPARENT MATERIAL COATED THEREWITH
摘要 <p>PURPOSE: A photochromic primer composition with high impact resistance and a transparent material coated therewith are provided to show high optical density and rapid coloring/beaching rate. CONSTITUTION: The photochromic primer composition comprises (a) 5-90 parts by weight of a polyurethane containing Broensted salts, (b) 5-50 parts by weight of a polyepoxy resin; and (c) 1-40 parts by weight of a photochromic dye. In the primer composition, the Broensted salts is present in a gram equivalent of 1 to 100 with respect to 1 x 10¬6g of polyurethane. The polyurethane is prepared by reacting an isocyanate with a polyol in such an amount that the mole ratio(NCO/OH) of NCO to OH in polyurethane is 0.5-3.0. Such primer composition is coated onto a transparent material, followed by cured to form a photochromic transparent material comprising a primer layer.</p>
申请公布号 KR20050016199(A) 申请公布日期 2005.02.21
申请号 KR20040062008 申请日期 2004.08.06
申请人 LG CHEM. LTD. 发明人 HAN, SE HUI;JANG, SUNG HOON;LIM, SUNG HYUN
分类号 C09D175/04;(IPC1-7):C09D175/04 主分类号 C09D175/04
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