METHOD FOR FORMING PHOTO MASK FRAME PATTERNS CAPABLE OF PREVENTING PHOTOSENSITIVE FROM REMAINING ON FRAME REGION AFTER EXPOSURE PROCESS

摘要

PURPOSE: A method for forming photo mask frame patterns is provided to prevent a photosensitive from remaining on a frame region after an exposure process by spacing an interface of overlay key blind regions in frames by a distance greater than a predetermined value. CONSTITUTION: An overlay key is formed on a photo mask frame region. A blind region is formed on the photo mask frame region in order to protect the overlay key from being affected by a short patterning. The blind region of each of adjacent two shorts is spaced from each other by a distance greater than a predetermined value.