发明名称 APPARATUS AND METHOD FOR INSPECTING DEFECTS CAPABLE OF IMPROVING ACCURACY IN DEFECT INSPECTION AND REDUCING INSPECTION TIME
摘要 PURPOSE: An apparatus and a method for inspecting defects are provided to improve accuracy in defect inspection and reduce inspection time by calculating an optimal amplification ratio based on regional characteristics on an object to be inspected. CONSTITUTION: An apparatus for inspecting defects includes a stage(140), a light emitter(110), a detector(130), a controller(160), and a determiner(170). The stage supports and transfers an object to be inspected. The light emitter is apart from the stage by a predetermined distance and sequentially illuminates a light to at least two regions on the object to be inspected. The detector collects the light reflected from the object to be inspected and amplifies the collected light by an amplification ratio. The controller varies the amplification ratio according to regional characteristics corresponding to a variance of the amplified light. The determiner analyzes the amplified light and determines an error on the object to be inspected.
申请公布号 KR20050015065(A) 申请公布日期 2005.02.21
申请号 KR20030053537 申请日期 2003.08.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, SUN YONG;CHON, SANG MUN;JUN, CHUNG SAM;KIM, JOUNG SOO;KIM, MOON KYUNG;YANG, YU SIN
分类号 G01N21/00;G01N21/55;G01N21/95;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N21/00
代理机构 代理人
主权项
地址