发明名称 |
BEAM HOMOGENIZER, LASER IRRADIATION APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ESPECIALLY CAPABLE OF CORRECTING VARIATION OF LASER BEAM INTENSITY |
摘要 |
PURPOSE: A beam homogenizer, a laser irradiation apparatus and a method for manufacturing a semiconductor device are provided to improve irradiation intensity of laser beam. CONSTITUTION: According to the beam homogenizer, an optical element system divides a laser beam into a fixed direction and then synthesizes the divided laser beam. The beam homogenizer further includes an optical element system dividing the laser beam to a direction vertical to the above direction. And a light waveguide(103) makes uniform intensity distribution of the laser beam to the fixed direction. The light waveguide has a pair of reflective planes facing with each other.
|
申请公布号 |
KR20050016120(A) |
申请公布日期 |
2005.02.21 |
申请号 |
KR20040061261 |
申请日期 |
2004.08.04 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY K.K. |
发明人 |
TANAKA, KOICHIRO |
分类号 |
H01S5/10;B23K26/06;B23K26/067;B23K26/073;G02B6/42;G02B27/09;G03F7/20;H01L21/26;H01S3/00;(IPC1-7):H01S5/10 |
主分类号 |
H01S5/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|