发明名称 ВЫСОКОЧАСТОТНЫЙ ИСТОЧНИК ИОНОВ
摘要 FIELD: ion-plasma material treatment technologies. ^ SUBSTANCE: proposed device for ion-plasma treatment of solid body surface has high-frequency oscillator, reactor, and magnetic system. High-density ion stream is produced and directed to surface being treated by means of magnetic system that has two annular magnets (top and bottom ones) whose unlike-polarity magnetic poles are closed through magnetic circuit outside of reactor. Magnetic system builds up magnetic field within reactor whose contour of magnetic lines of force is shaped due to magnetic system poles not closed with magnetic circuit, lower component of magnetic field formed by top annular magnet disposed close to HF energy input assembly being used only. ^ EFFECT: enhanced degree of plasma ionization, facilitated production of directed stream of high-density ions. ^ 1 cl, 2 dwg
申请公布号 RU2003116083(A) 申请公布日期 2005.02.20
申请号 RU20030116083 申请日期 2003.05.30
申请人 Кошкин Валерий Викторович (RU) 发明人 Кошкин Валерий Викторович (RU)
分类号 H01J1/00;H01J27/18 主分类号 H01J1/00
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