| 摘要 |
PROBLEM TO BE SOLVED: To provide a safety mechanism for lithographic pattern forming apparatus. SOLUTION: A lithographic apparatus is provided with an irradiation system which supplies a radiated beam, a supporting structure which supports a pattern forming apparatus which imparts a pattern to the cross section of the radiated beam, and a substrate holding tool which holds a substrate having a plurality of target sections. The apparatus is also provided with a projecting system which projects the patterned beam upon the target sections of the substrate, a connecting tool which fixes the pattern forming apparatus to the supporting structure, and the safety mechanism which is constituted to suppress the uncontrolled displacement of the pattern forming apparatus when the connecting tool becomes out of order. COPYRIGHT: (C)2005,JPO&NCIPI
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