| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device wherein cleaning of a substrate and a vacuum chuck is possible, whose footprint is small and operation time (line of flow) is short. SOLUTION: In the cleaning device 1, brush cleaning mechanism 31 of a substrate and cleaning mechanism 32 of the chuck are integrated in a body on the same shaft core 33a in the vertical direction. Thereby an area occupied by the cleaning device in index rear face grinding attachment can be made small. In a conventional cleaning device wherein a brush cleaning mechanism and a chuck cleaner are arranged in horizontally parallel, the line of flow is long wherein movement of the brush cleaning mechanism onto the chuck and horizontal direction movement of the chuck cleaner are performed alternately. In the cleaning device in this invention, the horizontal movement becomes unnecessary, so that the throughput time can be shortened. COPYRIGHT: (C)2005,JPO&NCIPI
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