PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus having a simple structure capable of supplying large electric power by using a waveguide, treating a rectangular large-area substrate by plasma with excellent uniformity, and to provide a plasma processing method.

SOLUTION: The plasma processing apparatus comprises an electromagnetic wave source 3 outputting electromagnetic waves; a waveguid part 17 for distributing electromagnetic waves output from the source 3; a plurality of waveguides 1 coupled respectively with the waveguide part 17 and disposed on the same plane; a plurality of slots 2 disposed at each waveguide 1; at least one electromagnetic wave emitting window 4 disposed oppositely to each slot 2; and a vacuum container 5 for generating plasma with the electromagnetic waves emitted from the window 4. The wavwguide part 17 is disposed on the plurality of wavegiudes 1.

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