| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a hollow structure, a manufacturing method for an MEMS element, and a manufacturing method for an electron beam mask capable of easily and inexpensively manufacturing by using a metallic film as a sacrificial layer and optimally combining a film material constituting the structure and an etchant of the sacrificial layer. <P>SOLUTION: The manufacturing method for the hollow structure includes a step of forming the sacrificial layer 7 made of a first metallic material at a position where a cavity is to be formed on a substrate 1, a step of forming the film 9 made of a second metallic material on the sacrificial layer 7, and a step of forming the cavity 14 by etching off the sacrificial layer 7 with an etchant which does not damage the second metallic material. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
