| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography projection apparatus having an exposure device and a measurement device the accuracy and the device manufacturing method of which have been improved. SOLUTION: The exposure device projects patterned beams to the target part of a first substrate and on the other hand, the measurement device projects measurement beams to the target part of a second substrate. When a movable part of the device moves, due to the displacement of air, for example, a disturbance is caused to occur at the other movable part of the device. This error can be corrected by calculating a correction signal that is a function of a state of either or both of the movable parts. COPYRIGHT: (C)2005,JPO&NCIPI |
