| 摘要 |
An exposure apparatus projects a pattern on an original onto a substrate via a projection optical system while scanning the original and the substrate. The apparatus includes a stage which holds and moves the substrate; a projection system which projects a slit shot pattern formed on the original onto plural areas of the substrate and an area partially overlapping four of the plural areas adjacent to each other, by having the original stand still and moving the stage; a measurement system which measures a positional deviation between partial patterns included in the shot patterns in the overlapping area; and a control system which controls movement of the stage based on a result of measurement by the measurement system.
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