| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a solution discharge machine having no possibility of scattering of sample encapsulating solution or the like, capable of preventing decline of a processing capacity of sample enclosure, and preventing generation of liquid drip from a nozzle. <P>SOLUTION: This solution discharge machine discharges the sample enclosure solution sucked by sucking operation of a pump, from a discharge nozzle to a slide glass by discharge operation by opening/closing of check valves for discharge and suction depending on the internal pressure of the pump. In the solution discharge machine, a nozzle head 203 equipped with a discharge nozzle 110 becomes rotatable and liftable by being mounted on a rotatable and liftable rotary main shaft 230, and after the discharge nozzle 110 is rotated and the sample enclosure solution is discharged therefrom, the nozzle head 203 is rotated and simultaneously lifted up to a washing position, and then the nozzle head 203 is lowered, to thereby dip the discharge nozzle into washing liquid in a nozzle washing vessel 300. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
