MANUFACTURING METHOD OF PHOTODETECTOR

摘要

PROBLEM TO BE SOLVED: To provide the manufacturing method of a photodetector which realizes rapid response. SOLUTION: The manufacturing method of the photodetector has a trench groove formation process as shown in the figure (a) for forming a trench groove 20 extending from the surface of an n--type layer 14 to an n+-type buried layer 13 around a region A1 provided with a photo detection surface S1 of a photodiode, and a connection layer formation process as shown in the figure (b) for forming an n+-type connection layer 21 extending from the surface of the n--type layer 14 to the n+-type buried layer 13 along a side wall 20a by diffusing n-type impurities from the side wall 20a of the trench groove 20 to the n--type layer 14. COPYRIGHT: (C)2005,JPO&NCIPI