发明名称 |
ABRASIVES FOR COPPER CMP AND METHODS FOR MAKING |
摘要 |
An aqueous chemical mechanical polishing slurry is provided that comprises precipitated amorphous silica abrasive particles treated with acidic aluminum. Also provided is a method of polishing an electronic component substrate comprising the steps of: a) obtaining an electronic component substrate, the electronic component substrate having an insulating film deposited over it, an interconnection pattern formed in the insulating film, and interconnection material deposited on the insulated film and in the interconnection pattern; and b) polishing the interconnection material until a surface of said insulating film is exposed by using an aqueous chemical mechanical polishing slurry comprising: precipitated amorphous silica abrasive particles treated with acidic aluminum. |
申请公布号 |
WO2004073922(A3) |
申请公布日期 |
2005.02.17 |
申请号 |
WO2004US04403 |
申请日期 |
2004.02.10 |
申请人 |
J.M. HUBER CORPORATION |
发明人 |
DUEN-WU, HUA;FRANDS, NIELSEN |
分类号 |
B24B37/04;C09G1/02;C09K3/14;H01L21/321 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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