发明名称 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
摘要 A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
申请公布号 US2005035300(A1) 申请公布日期 2005.02.17
申请号 US20030670328 申请日期 2003.09.26
申请人 CANON KABUSHIKI KAISHA;HITACHI, LTD. 发明人 IWASAKI YUICHI;MURAKI MASATO;TAMAMORI KENJI;ASANO KOUJI;ESASHI MASAYOSHI;NAKAYAMA YOSHINORI;HASHIMOTO SHINICHI;MORO YOSHIAKI
分类号 H01J37/147;(IPC1-7):H01J37/147 主分类号 H01J37/147
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