发明名称 |
Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus |
摘要 |
A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
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申请公布号 |
US2005035300(A1) |
申请公布日期 |
2005.02.17 |
申请号 |
US20030670328 |
申请日期 |
2003.09.26 |
申请人 |
CANON KABUSHIKI KAISHA;HITACHI, LTD. |
发明人 |
IWASAKI YUICHI;MURAKI MASATO;TAMAMORI KENJI;ASANO KOUJI;ESASHI MASAYOSHI;NAKAYAMA YOSHINORI;HASHIMOTO SHINICHI;MORO YOSHIAKI |
分类号 |
H01J37/147;(IPC1-7):H01J37/147 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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